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<article xlink="http://www.w3.org/1999/xlink" dtd-version="1.0" article-type="technology" lang="en"><front><journal-meta><journal-id journal-id-type="publisher">IJCRR</journal-id><journal-id journal-id-type="nlm-ta">I Journ Cur Res Re</journal-id><journal-title-group><journal-title>International Journal of Current Research and Review</journal-title><abbrev-journal-title abbrev-type="pubmed">I Journ Cur Res Re</abbrev-journal-title></journal-title-group><issn pub-type="ppub">2231-2196</issn><issn pub-type="opub">0975-5241</issn><publisher><publisher-name>Radiance Research Academy</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="publisher-id">2380</article-id><article-id pub-id-type="doi"/><article-id pub-id-type="doi-url"/><article-categories><subj-group subj-group-type="heading"><subject>Technology</subject></subj-group></article-categories><title-group><article-title>ANALYSIS OF ELECTROPLATING INDUSTRIAL EFFLUENT WITH REFERENCE TO CHROMIUM COMPOSITION&#13;
</article-title></title-group><contrib-group><contrib contrib-type="author"><name><surname>Tharannum</surname><given-names>Seema</given-names></name></contrib><contrib contrib-type="author"><name><surname>V.</surname><given-names>Krishnamurthy</given-names></name></contrib><contrib contrib-type="author"><name><surname>Mahmood</surname><given-names>Riaz</given-names></name></contrib></contrib-group><pub-date pub-type="ppub"><day>15</day><month>08</month><year>2017</year></pub-date><volume>)</volume><issue/><fpage>67</fpage><lpage>74</lpage><permissions><copyright-statement>This article is copyright of Popeye Publishing, 2009</copyright-statement><copyright-year>2009</copyright-year><license license-type="open-access" href="http://creativecommons.org/licenses/by/4.0/"><license-p>This is an open-access article distributed under the terms of the Creative Commons Attribution (CC BY 4.0) Licence. You may share and adapt the material, but must give appropriate credit to the source, provide a link to the licence, and indicate if changes were made.</license-p></license></permissions><abstract><p>Heavy metal pollution of soil and wastewater is an important environmental issue. The industries like tannery and electroplating are the main source of chromium pollution in India. They are required to comply with the regulations of the Central Pollution Control Boards and concerned State Pollution Control Boards. Thus, our present study contributes towards physicochemical studies and analysis of chromium content using Atomic Absorption Spectrophotometry (AAS) in the effluent released by electroplating industries in 4 different seasons specified by met office of a year to help in the understanding of pollution effects. Study reveals that the effluents from these industries contain Cr (VI) at concentrations ranging from tens to hundreds to thousands of mg/l and unfavorable levels of TSS, TDS, BOD and COD. There are standard values set by Pollution control Board for industrial effluent to be discharged on different types of land. Industrial effluent quality exceeding these specifications is thus harmful. It may cause biochemical effects, such as inhibition of enzymes, metabolic disorders, genetic damage, hypertension and cancer. Microbial load was also studied by enrichment technique which can further be applied for study of potential remediation of chromium.&#13;
</p></abstract><kwd-group><kwd>Atomic Absorption Spectrophotometry</kwd><kwd> chromium</kwd><kwd> Electroplating Industries</kwd><kwd> Industrial effluent</kwd><kwd> Pollution.</kwd></kwd-group></article-meta></front></article>
